PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PATTERNED RESIN FILM, CURED PRODUCT, PATTERNED CURED PRODUCT, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

To provide a photosensitive resin composition capable of forming a photosensitive resin film having an excellent alkali dissolution rate and exhibiting relatively high dissolution contrast.SOLUTION: The photosensitive resin composition has two phenolic hydroxyl groups and two amino groups in each mo...

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Main Authors MURAKAMI YOSUKE, HAGIWARA YUKI, YAMANAKA KAZUHIRO, EGUCHI HIROSHI, YAMADA MASAKI, HOSOI TAKESHI
Format Patent
LanguageEnglish
Japanese
Published 13.09.2023
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Summary:To provide a photosensitive resin composition capable of forming a photosensitive resin film having an excellent alkali dissolution rate and exhibiting relatively high dissolution contrast.SOLUTION: The photosensitive resin composition has two phenolic hydroxyl groups and two amino groups in each molecule. Two benzene rings contain polybenzoxazole precursor condensed with compounds linked by trifluoromethylene groups and dicarboxylic acid or dicarboxylic acid chloride, and a photosensitive agent.SELECTED DRAWING: None 【課題】アルカリ溶解速度に優れ、かつ、比較的高い溶解コントラストを発現する感光性樹脂膜を形成可能な感光性樹脂組成物を提供する。【解決手段】フェノール性水酸基及びアミノ基をそれぞれ、分子内に2個有し、2個のベンゼン環がトリフルオロメチレン基で連結された化合物とジカルボン酸又はジカルボン酸クロライドで縮合したポリベンゾオキサゾール前駆体と感光剤とを含むことを特徴とする感光性樹脂組成物。【選択図】なし
Bibliography:Application Number: JP20200133130