EXPOSURE METHOD AND EXPOSURE DEVICE

• Main Authors: ISO DAISUKE, NAKAI KAZUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 01.09.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To compensate exposure without lowering positional accuracy even if there is an exposure head which cannot attain an exposure due to defects.SOLUTION: An exposure method includes steps of: emitting light with a first exposure pattern toward a first exposure region from a first exposure head; emitting light with a second exposure pattern toward a second exposure region from the first exposure head; emitting light with a third exposure pattern toward a third exposure region from a second exposure head; and emitting light with a fourth exposure pattern toward a fourth exposure region from the second exposure head.SELECTED DRAWING: Figure 14 【課題】不具合などによって露光できない露光ヘッドがある場合であっても、位置精度を低下させずに露光を補う。【解決手段】露光方法は、第１の露光ヘッドから第１の露光領域に向けて第１の露光パターンで光を照射する工程と、第１の露光ヘッドから第２の露光領域に向けて第２の露光パターンで光を照射する工程と、第２の露光ヘッドから第３の露光領域に向けて第３の露光パターンで光を照射する工程と、第２の露光ヘッドから第４の露光領域に向けて第４の露光パターンで光を照射する工程とを備える。【選択図】図１４