SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

• Main Authors: SASAKI KEISUKE, SAITO YUKIYOSHI, TANAKA KOJI, HIRASE KEITA
• Format: Patent
• Language: English; Japanese
• Published: 31.08.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a technology that can improve productivity of a substrate processing system.SOLUTION: A substrate processing system according to an aspect of the present disclosure comprises: a carrying-in/out unit in which a cassette housing a plurality of substrates is carried-in/out; a batch processing unit that collectively processes a lot including the plurality of substrates; a sheet processing unit that processes the substrates of the lot one by one; and an interface unit that transfers/receives the substrates between the batch processing unit and the sheet processing unit. The batch processing unit comprises: a processing tank that immerses to process the lot; and a first carrying device that carries the lot to the processing tank. The interface unit comprises: an immersing tank that is arranged out of a moving range of the first carrying device and immerses the lot; and a second carrying device that transfers/receives the lot between the first carrying device and the immersing tank.SELECTED DRAWING: Figure 1 【課題】基板処理システムの生産性を向上させることができる技術を提供する。【解決手段】本開示の一態様による基板処理システムは、複数枚の基板を収容するカセットが搬入出される搬入出部と、複数枚の前記基板を含むロットを一括で処理するバッチ処理部と、前記ロットの前記基板を１枚ずつ処理する枚葉処理部と、前記バッチ処理部と前記枚葉処理部との間で前記基板を受け渡すインタフェース部と、を有し、前記バッチ処理部は、前記ロットを浸漬して処理する処理槽と、前記処理槽に前記ロットを搬送する第１搬送装置と、を有し、前記インタフェース部は、前記第１搬送装置の移動範囲外に配置され、前記ロットを浸漬する浸漬槽と、前記第１搬送装置と前記浸漬槽との間で前記ロットを受け渡す第２搬送装置と、を有する。【選択図】図１