WORK STAGE ANE EXPOSURE APPARATUS

• Main Authors: NAWAKI YOHEI, SUGISAKI SHUNTA
• Format: Patent
• Language: English; Japanese
• Published: 23.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

To provide a work stage capable of suppressing the pinching of foreign matter and properly holding a workpiece consisting of an organic substrate in a flat surface, and an exposure apparatus using the work stage.SOLUTION: In an exposure apparatus 100 having a work stage, a light irradiation unit 20, a mask 30, a mask stage 31 holding the mask, and a projection lens 40, the work stage 10 holding the organic substrate (workpiece W) has a base 11 formed with a recess 11a into which a vacuum is supplied, a number of substrate holding sections (pins) that are disposed inside the recess 11a and hold the entire surface of the organic substrate, and an intake hole that serves as an end of a vacuum air introduction channel 11b to supply vacuum to the recess 11a and vacuum adsorb the organic substrate on the top surface of the substrate holding sections.SELECTED DRAWING: Figure 1 【課題】異物の挟み込みを抑制し、有機基板からなるワークを適切に平面保持することができるワークステージおよびそのワークステージを使用した露光装置を提供する。【解決手段】ワークステージと、光照射部２０と、マスク３０と、マスクを保持するマスクステージ３１と、投影レンズ４０と、を備える露光装置１００において、有機基板（ワークＷ）を保持するワークステージ１０は、真空が供給される凹部１１ａが形成された基台１１と、凹部１１ａの内側に設けられ、有機基板の略全面を保持する多数の基板保持部（ピン）と、凹部１１ａに真空を供給し、基板保持部の上面に有機基板を真空吸着するための真空エアー導入路１１ｂの端部となる吸気孔と、を備える。【選択図】図１