WATERLESS LITHOGRAPHIC ORIGINAL PLATE AND METHOD FOR PRODUCING WATERLESS LITHOGRAPHIC PLATE USING THE SAME
To provide a waterless lithographic original plate that can give a waterless lithographic plate that can be subjected to pattern exposure using a general-purpose exposure machine, causes only a small amount of abrasion dust during exposure, does not require a developing step, and has excellent ink r...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
15.08.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a waterless lithographic original plate that can give a waterless lithographic plate that can be subjected to pattern exposure using a general-purpose exposure machine, causes only a small amount of abrasion dust during exposure, does not require a developing step, and has excellent ink resilience, ink receptivity and print durability.SOLUTION: A waterless lithographic original plate has a metal chelate-containing silicone layer on a support. As measured by X-ray photoelectron spectroscopy, the content of metal chelate-derived metal in the metal chelate-containing silicone layer is 0.2-1.8 atom%.SELECTED DRAWING: None
【課題】汎用露光機によるパターン露光が可能であり、露光時のアブレーション塵の発生が少なく、現像工程を要することなく、良好なインキ反発性、インキ着肉性と耐刷性を有する水なし平版印刷版を得ることのできる水なし平版印刷版原版を提供すること。【解決手段】支持体上に金属キレート含有シリコーン層を有し、X線光電分光法により測定した当該金属キレート含有シリコーン層中における金属キレート由来の金属濃度が0.2~1.8atom%である、水なし平版印刷版原版。【選択図】なし |
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Bibliography: | Application Number: JP20220014665 |