ULTRAPURE WATER PRODUCTION FACILITY

To provide an ultrapure water production facility capable of preventing residual water in a bypass channel from mixing with ultrapure water.SOLUTION: Water in a sub-tank 1 is treated by a pump 2, a heat exchange device 3, a UV oxidation device 4, a deionization device 5, and a UF membrane separation...

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Bibliographic Details
Main Authors HOSOBE KEIJI, MORI HAYATO
Format Patent
LanguageEnglish
Japanese
Published 26.07.2023
Subjects
CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Summary:To provide an ultrapure water production facility capable of preventing residual water in a bypass channel from mixing with ultrapure water.SOLUTION: Water in a sub-tank 1 is treated by a pump 2, a heat exchange device 3, a UV oxidation device 4, a deionization device 5, and a UF membrane separation device 7 to make ultrapure water. A bypass flow path 20 is provided to bypass the UF membrane separator 7. The bypass flow path 20 has first piping 21, a first valve 22, second piping 23, a second valve 24, and third piping 25. The first piping 21 is connected to piping 6 and the third piping 25 is connected to piping 8. Lengths of the piping 21 and 25 are short.SELECTED DRAWING: Figure 2 【課題】バイパス流路内の残留水が超純水に混入することが防止される超純水製造設備を提供する。【解決手段】サブタンク１内の水が、ポンプ２、熱交換装置３、ＵＶ酸化装置４、脱イオン装置５及びＵＦ膜分離装置７で処理されて超純水とされる。ＵＦ膜分離装置７を迂回するようにバイパス流路２０が設けられている。バイパス流路２０は、第１配管２１、第１バルブ２２、第２配管２３、第２バルブ２４、及び第３配管２５を備えている。第１配管２１が配管６に連なり、第３配管２５が配管８に連なっている。配管２１，２５の長さは短いものとなっている。【選択図】図２
Bibliography:Application Number: JP20220003800