HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

• Main Authors: KIM SEUNG-HYUN, PARK SANGCHOL, PARK YUSHIN, CHOI SEIL, SHIN SEUNG-WOOK, CHOE HUISEON, KIM SANGMI
• Format: Patent
• Language: English; Japanese
• Published: 24.07.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a hardmask composition that can be effectively applied to a hard mask layer, the hardmask layer comprising a cured product of the hard mask composition, and a method of forming patterns using the hardmask composition.SOLUTION: A hard mask composition comprises a polymer comprising a structural unit represented by the following chemical formula 1, and a solvent. The chemical formula 1 is defined as in the specifications.SELECTED DRAWING: None 【課題】ハードマスク層に効果的に適用することができるハードマスク組成物、該ハードマスク組成物の硬化物を含むハードマスク層、および該ハードマスク組成物を使用したパターン形成方法を提供する。【解決手段】下記化学式１で表される構造単位を含む重合体、および溶媒を含む、ハードマスク組成物。JPEG2023102252000043.jpg53161上記化学式１の定義は、明細書内に記載した通りである。【選択図】なし