EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE

• Main Authors: SAITO YUKI, OTA KAZUKI, IMAI MASAKI, MIYAHARU TAKAFUMI
• Format: Patent
• Language: English; Japanese
• Published: 27.06.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a technique advantageous in suppressing a stage control residual.SOLUTION: An exposure apparatus for exposing a substrate via an original plate, includes: a substrate stage for holding the substrate; an obtaining unit for obtaining, for each of a plurality of exposure regions to be exposed of the substrate, surface positions in a height direction at a plurality of measurement points in the exposure region; and a control unit for controlling, based on the surface positions obtained by the obtaining unit, driving of the substrate stage in the height direction when exposing each of the plurality of exposure regions. The control unit finds, for each of the plurality of exposure regions, an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the surface positions obtained by the obtaining unit, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range among the plurality of exposure regions, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.SELECTED DRAWING: Figure 6 【課題】ステージ制御残差を抑制するのに有利な技術を提供する。【解決手段】原版を介して基板を露光する露光装置であって、前記基板を保持する基板ステージと、前記基板の露光すべき複数の露光領域のそれぞれについて、当該露光領域の複数の計測点の高さ方向の表面位置を取得する取得部と、前記取得部で取得された前記表面位置に基づいて、前記複数の露光領域のそれぞれを露光する際の前記高さ方向に関する前記基板ステージの駆動を制御する制御部と、を有し、前記制御部は、前記複数の露光領域のそれぞれについて、前記取得部で取得された前記表面位置から前記露光領域の表面の断面形状を近似して表す近似面を求め、前記複数の露光領域のうち、前記近似面に関する情報が所定の範囲を超えていない第１露光領域については、前記第１露光領域よりも前に露光された露光領域の表面の断面形状を近似して表す近似面から得られた前記駆動に関する補正値に基づいて、前記駆動を制御することを特徴とする露光装置を提供する。【選択図】図６