CLEANING SOLUTION USED FOR CLEANING METAL RESIST AND CLEANING METHOD USING THE SAME

To provide a cleaning solution used for cleaning a metal resist with improved metal removability and reduced organic residuals and a cleaning method using the same.SOLUTION: The cleaning solution is used for cleaning a metal resist. The cleaning solution contains a solvent and sulfuric acid. A pH va...

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Bibliographic Details
Main Authors KUMAGAI TOMOYA, SUGAWARA MAI
Format Patent
LanguageEnglish
Japanese
Published 26.06.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:To provide a cleaning solution used for cleaning a metal resist with improved metal removability and reduced organic residuals and a cleaning method using the same.SOLUTION: The cleaning solution is used for cleaning a metal resist. The cleaning solution contains a solvent and sulfuric acid. A pH value of the cleaning solution diluted 10 times with pure water is 2.5 or less as measured with a pH meter.SELECTED DRAWING: None 【課題】金属除去性が向上し、有機物残留量が低減された、金属レジストを洗浄するために用いられる洗浄液、及び該洗浄液を用いた洗浄方法の提供。【解決手段】金属レジストを洗浄するために用いられる洗浄液であって、溶剤と硫酸とを含有し、前記洗浄液を純水で１０倍に希釈した液の、ｐＨメーターで測定したｐＨ値が２．５以下である洗浄液。【選択図】なし
Bibliography:Application Number: JP20220131931