CLEANING LIQUID FOR REMOVING METAL RESIST, AND CLEANING METHOD USING THE CLEANING LIQUID

• Main Authors: KUMAGAI TOMOYA, SUGAWARA MAI
• Format: Patent
• Language: English; Japanese
• Published: 26.06.2023
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

To provide a cleaning liquid for use in cleaning metal resist, with improved metal removability and reduced amounts of a residual organic matter, and a cleaning method using the cleaning liquid.SOLUTION: The present invention provides cleaning liquid for use in cleaning metal resist. The cleaning liquid contains a solvent and a strong acid to be liquid at 20°C. The cleaning liquid diluted by a factor of 10 folds with pure water has a pH value of 2.5 or less as measured with a pH meter.SELECTED DRAWING: None 【課題】金属除去性が向上し、有機物残留量が低減された、金属レジストを洗浄するために用いられる洗浄液、及び該洗浄用いた洗浄方法の提供。【解決手段】金属レジストを洗浄するために用いられる洗浄液であって、溶剤と２０℃で液体の強酸とを含有し、前記洗浄液を純水で１０倍に希釈した液の、ｐＨメーターで測定したｐＨ値が２．５以下である洗浄液。【選択図】なし