VAPORIZING DEVICE, SUBSTRATE PROCESSING SYSTEM AND METHOD OF VAPORIZING

• Main Authors: SHINDO YUYA, OKABE YASUYUKI, NAKAGAWA MIZUKI, HIRAO YOSHIYUKI, AYAI YUTA, TOKUDA ICHIRO
• Format: Patent
• Language: English; Japanese
• Published: 23.06.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a technology that can monitor temperature of liquid stored in a vaporizing device with high accuracy.SOLUTION: A vaporizing device includes: a housing; a tray installed in the housing to store a liquid raw material; a temperature sensor embedded in a bottom wall of the tray; and a heater for heating the liquid raw material.SELECTED DRAWING: Figure 7 【課題】気化装置内に貯留される液体の温度を高い精度で監視できる技術を提供する。【解決手段】本開示の一態様による気化装置は、筐体と、前記筐体内に設けられ、液体原料を貯留するトレイと、前記トレイの底壁に埋め込まれる温度センサと、前記液体原料を加熱するヒータと、を有する。【選択図】図７