SEMICONDUCTOR DEVICE

To provide a semiconductor device capable of suppressing deterioration of forward current-voltage characteristics and a forward breakdown current, suppressing expansion of an element area, and improving a reverse breakdown voltage.SOLUTION: A semiconductor devices includes: a diode element that incl...

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Bibliographic Details
Main Authors TANAKA HIROYUKI, AZUMA MASAHIKO
Format Patent
LanguageEnglish
Japanese
Published 13.06.2023
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Summary:To provide a semiconductor device capable of suppressing deterioration of forward current-voltage characteristics and a forward breakdown current, suppressing expansion of an element area, and improving a reverse breakdown voltage.SOLUTION: A semiconductor devices includes: a diode element that includes, on the surface of a semiconductor substrate 1 having the first conductivity type, which is P-type or N-type, a high-concentration first-conductivity-type impurity region 6 having a first conductivity type, a high-concentration second-conductivity-type impurity region 5 having a second conductivity type opposite to the first conductivity type, and an element isolation region 2 in contact with one end of high-concentration first-conductivity-type impurity region and one end of high-concentration second-conductivity-type impurity region, and uses a PN junction; and a floating layer 3 having a second conductivity type separated from the high concentration second conductivity type impurity region below the high concentration second conductivity type impurity region in the semiconductor substrate.SELECTED DRAWING: Figure 1 【課題】順方向電流電圧特性及び順方向破壊電流の低下並びに素子面積の拡大が抑制されるとともに、逆方向破壊耐圧を向上させることがきる半導体装置を提供する。【解決手段】P型又はN型である第1の導電型を有する半導体基板1の表面において、第1の導電型を有する高濃度第1導電型不純物領域6、第1の導電型とは逆の導電型である第2の導電型を有する高濃度第2導電型不純物領域5、及び高濃度第1導電型不純物領域の一端と高濃度第2導電型不純物領域の一端に接する素子分離領域2を含む、PN接合を利用したダイオード素子と、半導体基板における高濃度第2導電型不純物領域の下方に高濃度第2導電型不純物領域と離間した第2の導電型を有する浮遊層3と、を備えた半導体装置。【選択図】図1
Bibliography:Application Number: JP20230056106