PATTERNING METHOD OF QUANTUM DOT, MANUFACTURING METHOD OF OPTICAL ELEMENT, MANUFACTURING METHOD OF BACKLIGHT UNIT AND MANUFACTURING METHOD OF IMAGE DISPLAY DEVICE

• Main Authors: NOJIMA YOSHIHIRO, AOKI SHINJI, TOBISHIMA KAZUYA
• Format: Patent
• Language: English; Japanese
• Published: 30.05.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES

To provide a patterning method of a quantum dot which can stably perform the target pattern formation of a quantum dot without being subjected to restriction due to an ink jet method and can suppress the degradation in the quantum dot.SOLUTION: A patterning method of a quantum dot comprises: a step...