PATTERNING METHOD OF QUANTUM DOT, MANUFACTURING METHOD OF OPTICAL ELEMENT, MANUFACTURING METHOD OF BACKLIGHT UNIT AND MANUFACTURING METHOD OF IMAGE DISPLAY DEVICE

To provide a patterning method of a quantum dot which can stably perform the target pattern formation of a quantum dot without being subjected to restriction due to an ink jet method and can suppress the degradation in the quantum dot.SOLUTION: A patterning method of a quantum dot comprises: a step...

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Bibliographic Details
Main Authors NOJIMA YOSHIHIRO, AOKI SHINJI, TOBISHIMA KAZUYA
Format Patent
LanguageEnglish
Japanese
Published 30.05.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:To provide a patterning method of a quantum dot which can stably perform the target pattern formation of a quantum dot without being subjected to restriction due to an ink jet method and can suppress the degradation in the quantum dot.SOLUTION: A patterning method of a quantum dot comprises: a step of obtaining a resin layer by applying a mixture containing a quantum dot and a curable resin onto a substrate; a step of discharging a curing agent by an ink jet method onto the resin layer in a pattern shape; a curing processing step of curing a portion to which the curing agent is discharged in the resin layer; and a step of removing an uncured portion in the resin layer with a solvent.SELECTED DRAWING: Figure 1 【課題】インクジェット方式に起因する制限を受けることなく安定して目的とする量子ドットのパターン形成を行うことができ、量子ドットの劣化を抑制することもできる量子ドットのパターニング方法を提供すること。【解決手段】量子ドットのパターニング方法であって、量子ドットと硬化性樹脂とを含有する混合物を基板上に塗布して、樹脂層を得る工程と、前記樹脂層上に、インクジェット方式により硬化剤をパターン状に吐出する工程と、前記樹脂層のうち前記硬化剤が吐出された部分を硬化させる硬化処理工程と、前記樹脂層のうち未硬化部分を溶剤で除去する工程とを含むことを特徴とする量子ドットのパターニング方法。【選択図】図１
Bibliography:Application Number: JP20210187456