INSPECTION ILLUMINATION DEVICE AND INSPECTION SYSTEM

• Main Author: FUJITA ATSUKO
• Format: Patent
• Language: English; Japanese
• Published: 26.05.2023
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

To provide an inspection illumination device capable of imaging a whole periphery of side surface parts of a workpiece by once imaging so as to realize an excellent S/N ratio while having a simple configuration.SOLUTION: An inspection illumination device includes: a first irradiation optical path L11 for radiation of first inspection light to a first side surface part W1 of a workpiece W; and a first detection optical path L12 from the first side surface part W1 to an imaging mechanism 4. The device comprises: a first optical system 1 which allows the first inspection light to be radiated to the first side surface part W1 in a polarized state in a predetermined direction; and a second optical system 2 which includes a second irradiation optical path L21 for radiation of second inspection light to a second side surface part W2 of the workpiece, being the side surface part on the opposite side of the first side surface part W1, and a second detection optical path L22 from the second side surface part W2 to the imaging mechanism 4, and allows the second inspection light to be radiated to the second side surface part W2 in a state polarized in the same direction as the direction of the first inspection light. At least partial polarization components of the first inspection light and the second inspection light where a change occurs in polarization by reflection/dispersion in the workpiece W are made incident to the imaging mechanism 4, and also the light polarized in the predetermined direction is prevented from being made incident to the imaging mechanism 4.SELECTED DRAWING: Figure 1 【課題】簡単な構成でありながら、一度の撮像でワークの側面部の全周を撮像でき、良好なＳ／Ｎ比を実現できる検査用照明装置を提供する。【解決手段】第１検査光がワークＷの第１側面部Ｗ１に至る第１照射光路Ｌ１１、及び、前記第１側面部Ｗ１から前記撮像機構４に至る第１検出光路Ｌ１２を具備し、第１検査光が所定方向に偏光した状態で前記第１側面部Ｗ１に照射されるように構成された第１光学系１と、第２検査光が前記第１側面部Ｗ１の反対側である前記ワークの第２側面部Ｗ２に至る第２照射光路Ｌ２１、及び、前記第２側面部Ｗ２から前記撮像機構４に至る第２検出光路Ｌ２２を具備し、第２検査光が第１検査光と同じ方向に偏光した状態で前記第２側面部Ｗ２に照射されるように構成された第２光学系２と、前記ワークＷで反射又は散乱されて偏光に変化が生じた第１検査光及び第２検査光の少なくとも一部の偏光成分を前記撮像機構４へ入射させるとともに、前記所定方向に偏光した光が前記撮像機構４に入射するのを防ぐように構成した。【選択図】図1