RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

• Main Authors: SOMEYA YASUO, KAIHO TAKAAKI
• Format: Patent
• Language: English; Japanese
• Published: 18.05.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a resist composition which achieves higher sensitivity and can form a resist pattern good in roughness reduction and patten shape.SOLUTION: The resist composition contains a base component (A), an acid generator component (B), and an acid diffusion control agent (D). The acid generator co...