LIGHT IRRADIATION DEVICE, MICROSCOPE DEVICE, LIGHT IRRADIATION METHOD, AND IMAGE ACQUISITION METHOD

• Main Authors: MATSUMOTO NAOYA, WATANABE KOYO
• Format: Patent
• Language: English; Japanese
• Published: 15.05.2023
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; TESTING

To provide a light irradiation device, a microscope device, a light irradiation method, and an image acquisition method with which, when using a ring mask, it is possible to raise a level of reduction of a focus spot diameter.SOLUTION: A light irradiation device 1 comprises: a light output unit 10 for outputting coherent light; and an optical system 20 for irradiating an object B with light La that is outputted from the light output unit 10. The optical system 20 includes an objective lens 27 for focusing the light La outputted from the light output unit 10 on to the object B, and a polarization conversion unit 22, a phase conversion unit 23 and a ring mask 24 provided on an optical path between the light output unit 10 and the object B. The polarization conversion unit 22 is constituted to convert the light La having been inputted to the polarization conversion unit 22 into, and output as, azimuth polarization. The phase conversion unit 23 is constituted to apply phase modulation by a spiral phase pattern to the light La having been inputted to the phase conversion unit 23.SELECTED DRAWING: Figure 1 【課題】リングマスクを用いる場合に集光径の小径化の程度を高めることができる光照射装置、顕微鏡装置、光照射方法、及び画像取得方法を提供する。【解決手段】光照射装置１は、コヒーレントな光を出力する光出力部１０と、光出力部１０から出力された光Ｌａを対象物Ｂに照射する光学系２０と、を備える。光学系２０は、光出力部１０から出力された光Ｌａを対象物Ｂにおいて集光させる対物レンズ２７と、光出力部１０と対象物Ｂとの間の光路上に設けられた偏光変換部２２、位相変換部２３、及びリングマスク２４と、を有する。偏光変換部２２は、偏光変換部２２に入力された光Ｌａをアジマス偏光に変換して出力するように構成される。位相変換部２３は、位相変換部２３に入力された光Ｌａにらせん型の位相パターンによる位相変調を与えるように構成される。【選択図】図１