PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHOD

• Main Authors: HASEGAWA KOJI, WATANABE ASAMI, FUJIWARA NORIYUKI
• Format: Patent
• Language: English; Japanese
• Published: 27.04.2023
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DYES; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a chemically amplified resist composition which is excellent in balance of sensitivity, CDU, LWR, MEF and DOF in photolithography using high-energy rays as a light source and can form a rectangular pattern, a photoacid generator used therefor, and a pattern forming method using the resist composition.SOLUTION: The photoacid generator is an onium salt compound which comprises an anion containing an iodine atom-substituted aromatic group and two sulfonate groups, and a sulfonium cation or an iodonium cation. The chemically amplified resist composition contains the photoacid generator.SELECTED DRAWING: None 【課題】高エネルギー線を光源とするフォトリソグラフィーにおいて、感度、ＣＤＵ、ＬＷＲ、ＭＥＦ、ＤＯＦのバランスに優れ、かつ矩形なパターンを形成できる化学増幅レジスト組成物、これに使用される光酸発生剤、及び該レジスト組成物を用いるパターン形成方法を提供する。【解決手段】ヨウ素原子で置換された芳香族基と２つのスルホネート基とを含むアニオン及びスルホニウムカチオン又はヨードニウムカチオンからなるオニウム塩化合物である光酸発生剤、及び該光酸発生剤を含む化学増幅レジスト組成物。【選択図】なし