ORGANOMETALLIC ADDUCT COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME

• Main Authors: KIM JAEWOON, YOSHII TAKAHIRO, HARANO KAZUKI, PARK GYUHEE, UCHIOKURA HIROYUKI, FUSE WAKANA, AOKI YUTARO, KOIDE YUKINOBU, CHO YOUN-JOUNG, KIM YOON-SOO, SAITO KAZUYA, RYU SEUNG-MIN, MANABE YOSHIKI, KIMURA MASAYUKI
• Format: Patent
• Language: English; Japanese
• Published: 28.03.2023
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HETEROCYCLIC COMPOUNDS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide an organometallic adduct compound and a method of manufacturing an integrated circuit device by using the same.SOLUTION: The invention provides an organometallic adduct compound of the general formula in the figure. In the formula, R1, R2, R3, R4 and R5 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1-C5 linear alkyl group, a substituted or unsubstituted C3-C5 branched alkyl group, a substituted or unsubstituted C2-C5 linear alkenyl group, or a substituted or unsubstituted C3-C5 branched alkenyl group; X is a halogen atom; and M is a niobium atom or a tantalum atom.SELECTED DRAWING: Figure 1 【課題】有機金属付加化合物及びそれを用いた集積回路素子の製造方法を提供する。【解決手段】下記一般式の有機金属付加化合物。TIFF2023043193000048.tif48170式中、Ｒ１、Ｒ２、Ｒ３、Ｒ４、及びＲ５は、それぞれ独立して水素原子、ハロゲン原子、置換または非置換のＣ１－Ｃ５の直鎖状アルキル基、置換または非置換のＣ３－Ｃ５の分岐状アルキル基、置換または非置換のＣ２－Ｃ５の直鎖状アルケニル基、または置換または非置換のＣ３－Ｃ５の分岐状アルケニル基であり、Ｘは、ハロゲン原子であり、Ｍは、ニオブ原子またはタンタル原子である。【選択図】図１