HYDROGEN HEATING APPARATUS FOR BLAST FURNACE, HYDROGEN HEATING METHOD FOR BLAST FURNACE, AND BLAST FURNACE OPERATION METHOD

To provide a novel hydrogen heating apparatus for blast furnace, a hydrogen heating method for blast furnace and a blast furnace operation method in which a generation amount of CO2 can be suppressed even if hydrogen-based gas is used as reducing gas.SOLUTION: A hydrogen heating apparatus for blast...

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Bibliographic Details
Main Authors ITO TAKEHIKO, IWAMURA YASUHIRO, ENDO YOSHITAKA, YOSHINO HIDEKI
Format Patent
LanguageEnglish
Japanese
Published 13.03.2023
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Summary:To provide a novel hydrogen heating apparatus for blast furnace, a hydrogen heating method for blast furnace and a blast furnace operation method in which a generation amount of CO2 can be suppressed even if hydrogen-based gas is used as reducing gas.SOLUTION: A hydrogen heating apparatus for blast furnace 11 comprises: a sealed container 15 into which hydrogen-based gas is introduced; a heat generator 14 which is provided inside sealed container 15, and generates heat by storage and emission of hydrogen; and a temperature adjustment part which adjusts the temperature of the heat generator 14; where the heat generator 14 has one or more laminates 14a that consist of a support body 61 which is formed of at least any one of a porous body, a hydrogen permeable membrane, and a proton conductor, and a multilayer film 62 supported by the support body 61, the multilayer film 62 has: a first layer which is formed of hydrogen storage metal or hydrogen storage alloy, and has the thickness of less than 1000 nm; and a second layer which is formed of hydrogen storage metal, hydrogen storage alloy or ceramics different from the first layer, and has the thickness of less than 1000 nm, and hydrogen-based gas is heated to a predetermined temperature by heating by heat generator 14.SELECTED DRAWING: Figure 5 【課題】還元ガスとして水素系ガスを用いてもCO2の発生量を抑制することができる新規な高炉用水素加熱装置、高炉用水素加熱方法および高炉操業方法を提供する。【解決手段】高炉用水素加熱装置11は、水素系ガスが導入される密閉容器15と、密閉容器15の内部に設けられ、かつ、水素の吸蔵と放出とにより熱を発生する発熱体14と、発熱体14の温度を調節する温度調節部と、を備え、発熱体14は、多孔質体、水素透過膜、およびプロトン導電体のうち少なくともいずれかにより形成された支持体61と、支持体61に支持された多層膜62とでなる1つ以上の積層体14aを有し、多層膜62は、水素吸蔵金属または水素吸蔵合金により形成され、厚みが1000nm未満である第1層と、第1層とは異なる水素吸蔵金属、水素吸蔵合金、またはセラミックスにより形成され、厚みが1000nm未満である第2層とを有しており、発熱体14による加熱によって水素系ガスが所定の温度に加熱される。【選択図】図5
Bibliography:Application Number: JP20210141969