SUBSTRATE PROCESSING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

• Main Author: AIDA MAKOTO
• Format: Patent
• Language: English; Japanese
• Published: 09.03.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To suppress variations in a width of a film formed in a substrate outer edge part and an exposed width of the substrate outer edge part.SOLUTION: A substrate processing device of an embodiment comprises: a substrate holding unit for holding a substrate; a rotation support unit for supporting the substrate holding unit and rotating the substrate held in the substrate holding unit in a circumferential direction; a driving unit for driving the substrate holding unit in a surface direction of the substrate with respect to the rotation support unit; a detection unit for detecting an outer edge part of the substrate held in the substrate holding unit; a chemical discharge unit for discharging chemical to the outer edge part held in the substrate holding unit; and a control unit for driving the substrate holding unit by the driving unit so that a center position in a plane of the substrate held in the substrate holding unit matches a rotation shaft of the rotation support unit on the basis of a position of the outer edge part detected by the detection unit.SELECTED DRAWING: Figure 3 【課題】基板外縁部に形成される膜の幅、及び基板外縁部の露出幅のばらつきを抑制すること。【解決手段】実施形態の基板処理装置は、基板を保持する基板保持部と、基板保持部を支持し、基板保持部に保持された基板を周方向に回転させる回転支持部と、回転支持部に対して基板保持部を基板の面方向に駆動させる駆動部と、基板保持部に保持された基板の外縁部を検出する検出部と、基板保持部に保持された外縁部に薬液を吐出する薬液吐出部と、検出部が検出した外縁部の位置に基づいて、基板保持部に保持された基板の面内における中心位置が、回転支持部の回転軸と一致するように、駆動部により基板保持部を駆動させる制御部と、を備える。【選択図】図３