OVEN COOKING APPLIANCE

• Main Authors: SATO MIHO, SUGIMOTO TAKUYA, ONO KEITA, YAMAMOTO TAKAHIRO, MIZUTANI YASUOKI
• Format: Patent
• Language: English; Japanese
• Published: 16.02.2023
• Subjects: APPARATUS FOR MAKING BEVERAGES; BLASTING; COFFEE MILLS; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION; DOMESTIC ARTICLES OR APPLIANCES; FURNITURE; HEATING; HUMAN NECESSITIES; KITCHEN EQUIPMENT; LIGHTING; MECHANICAL ENGINEERING; OTHER DOMESTIC STOVES OR RANGES; RANGES; SPICE MILLS; SUCTION CLEANERS IN GENERAL; VENTILATING; WEAPONS

To prevent temperature within a baking furnace from decreasing excessively and prevent pressure within a baking furnace from increasing excessively even if generation of vapor within a baking furnace is enabled.SOLUTION: An oven cooling appliance 10 includes: a baking furnace 20 for baking a cooked object; a heater 42 for heating the inside of the baking furnace 20 while being disposed in an upper part within the baking furnace 20; a vapor generation part 50 for generating vapor within the baking furnace 20 while being disposed in an upper side of the heater 42 in an upper part within the baking furnace 20; and a control device 70 for controlling operation of the vapor generation part 50. The vapor generation part 50 includes a vapor generation tray 51 disposed in an upper side of the heater 42 and a water supply part 53 for supplying water to the vapor generation tray 51. The control device 70 has vapor generation processing for generating vapor by performing control so as to supply water from the water supply part 53 to the vapor generation tray 51 heated by the heater 42, and has water supply limitation processing capable of limiting water supply by the water supply part 53 in execution of the vapor generation processing.SELECTED DRAWING: Figure 17 【課題】焼成炉内で蒸気を発生させるようにしても、焼成炉内の温度が低下しすぎたり、焼成路内の圧力が高くなりすぎないようにする。【解決手段】オーブン調理装置１０は、被調理物を焼成するための焼成炉２０と、焼成炉２０内の上部に配設されて焼成炉２０内を加熱するヒータ４２と、焼成炉２０内の上部にてヒータ４２の上側に配設されて焼成炉２０内にて蒸気を発生させる蒸気発生部５０と、蒸気発生部５０の作動を制御する制御装置７０とを備え、蒸気発生部５０は、ヒータ４２の上側に配置された蒸気発生皿５１と、蒸気発生皿５１に水を供給する給水部５３とを備え、制御装置７０は、ヒータ４２により加熱された蒸気発生皿５１に給水部５３から水を供給させるように制御して蒸気を発生させる蒸気発生処理を備え、この蒸気発生処理を実行するときに、給水部５３による給水を制限可能とする給水制限処理を備えた。【選択図】図１７