ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

To provide an electrostatic chuck and a substrate fixing device for further suppressing occurrence of abnormal discharge.SOLUTION: A substrate fixing device 1 includes an electrostatic chuck 30 having: a substrate 31 in which one face serves as a mounting surface of an adsorption object; and a gas h...

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Bibliographic Details
Main Authors MIYAZAWA MASAKUNI, WATANABE MIZUKI, INOUE TOMOHIRO
Format Patent
LanguageEnglish
Japanese
Published 14.02.2023
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Summary:To provide an electrostatic chuck and a substrate fixing device for further suppressing occurrence of abnormal discharge.SOLUTION: A substrate fixing device 1 includes an electrostatic chuck 30 having: a substrate 31 in which one face serves as a mounting surface of an adsorption object; and a gas hole 33 which is a through-holes penetrating the substrate. A porous body 60 containing angular ceramic particles is disposed in the through-hole. The substrate and the angular ceramic particles contain same oxide ceramics. The oxide ceramics is alumina. Furthermore, the substrate and the porous body contain an oxide of at least 2 kinds of same elements, and the composition ratio of the oxide in the substrate is set equal to the composition ratio of the oxide in the porous body.SELECTED DRAWING: Figure 1 【課題】異常放電の発生をさらに抑制する静電チャック及び基板固定装置を提供する。【解決手段】基板固定装置1において、静電チャック30は、一方の面が吸着対象物の載置面である基体31と、基体を貫通する貫通孔であるガス孔33と、を備える。貫通孔には、角状セラミック粒子を含む多孔質体60が配置されている。基体と角状セラミック粒子は、同一の酸化物セラミックスを含む。酸化物セラミックスは、アルミナである。さらに、基体と多孔質体は、同一の2種以上の元素の酸化物を含み、基体内の酸化物の組成比は、多孔質体の内の酸化物の組成比と同じに設定される。【選択図】図1
Bibliography:Application Number: JP20210126602