CLEANING DEVICE, CLEANING METHOD, LIQUID DISCHARGE UNIT, AND LIQUID DISCHARGE DEVICE
To provide a cleaning device which enable stable liquid discharge from a liquid discharge surface.SOLUTION: A cleaning device which cleans a discharge surface from which a liquid is discharged, includes a suction processing part which applies suction processing to the discharge surface, a cleaning l...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
20.01.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a cleaning device which enable stable liquid discharge from a liquid discharge surface.SOLUTION: A cleaning device which cleans a discharge surface from which a liquid is discharged, includes a suction processing part which applies suction processing to the discharge surface, a cleaning liquid application processing part which applies processing of providing a cleaning liquid to the discharge surface after the suction processing, and a re-suction processing part which applies re-suction processing to the discharge surface after the cleaning liquid application processing.SELECTED DRAWING: Figure 1
【課題】液体吐出面の安定した液体吐出を可能にする清掃装置を提供する。【解決手段】液体を吐出する吐出面を清掃する清掃装置において、前記吐出面に対して吸引処理を施す吸引処理部と、前記吸引処理後の前記吐出面に対して洗浄液を付与する処理を施す洗浄液付与処理部と、前記洗浄液付与処理後の前記吐出面に対して再吸引処理を施す再吸引処理部とを備える。【選択図】図1 |
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Bibliography: | Application Number: JP20210113220 |