PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

To provide a technique of controlling the electric potential of a plasma.SOLUTION: A plasma processing method contains: a step of arranging a substrate to a substrate support part; a step of supplying a processing gas for processing the substrate into a chamber; a step of generating a plasma of the...

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Bibliographic Details
Main Author TAMAMUSHI GEN
Format Patent
LanguageEnglish
Japanese
Published 10.01.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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