HIGH-PRESSURE TANK AND MANUFACTURING METHOD THEREOF
To provide a high-pressure tank which can reliably prevent flow-in of raw material resin into a discharge hole during manufacturing, and a manufacturing method thereof.SOLUTION: A high-pressure tank comprises a liner 10 made of resin, a mouthpiece 12 and a reinforcing layer 13 made of fiber-reinforc...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
20.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a high-pressure tank which can reliably prevent flow-in of raw material resin into a discharge hole during manufacturing, and a manufacturing method thereof.SOLUTION: A high-pressure tank comprises a liner 10 made of resin, a mouthpiece 12 and a reinforcing layer 13 made of fiber-reinforced resin. The liner 10 defines a hollow fluid charging part. The mouthpiece 12 has a supply/discharge port 11 communicating with an internal space of the liner 10, and a flange part 12b hanging to a radially outer side from a peripheral area of the supply/discharge port 11 and abutting on the liner 10. The reinforcing layer 13 is coated across the liner 10 and an outer peripheral face of the flange part 12b. The mouthpiece 12 has a discharge hole 17 for providing communication a clearance between the flange part 12b and abutment faces 12bs, 14s of the liner 10, and the inside of the supply/discharge port 11. A capturing groove 19 surrounding a peripheral area of the discharge hole 17 is formed in least at either of the abutment face 12bs on the flange part 12b side and the abutment face 14s on the liner 10 side.SELECTED DRAWING: Figure 2
【課題】製造時における排出孔への母材樹脂の流入を確実に防止することができる高圧タンク、及び、その製造方法を提供する。【解決手段】高圧タンクは、樹脂製のライナ10と、口金12と、繊維強化樹脂製の補強層13と、を備える。ライナ10は中空状の流体充填部を構成する。口金12はライナ10の内部空間と連通する給排口11と、給排口11の周域から径方向外側に張り出しライナ10に突き合わせられるフランジ部12bを有する。補強層13は、ライナ10とフランジ部12bの外周面に跨って被着される。口金12には、フランジ部12bとライナ10の突合せ面12bs,14sの間と、給排口11の内部とを連通する排出孔17が設けられている。フランジ部12bの側の突合せ面12bsとライナ10の側の突合せ面14sの少なくともいずれか一方には、排出孔17の周域を取り囲む捕捉溝19が設けられている。【選択図】図2 |
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Bibliography: | Application Number: JP20210095977 |