NONDESTRUCTIVE INSPECTION SYSTEM AND NONDESTRUCTIVE INSPECTION METHOD
To provide a nondestructive inspection technique capable of enhancing both the ability to distinguish types of materials and their resolution.SOLUTION: A nondestructive inspection system 1 includes: an X-ray transmittance analysis unit 15 that analyzes the transmittance of X-ray R based on a differe...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
20.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a nondestructive inspection technique capable of enhancing both the ability to distinguish types of materials and their resolution.SOLUTION: A nondestructive inspection system 1 includes: an X-ray transmittance analysis unit 15 that analyzes the transmittance of X-ray R based on a difference between the intensity of X-ray R generated by an X-ray generator 4 and the intensity of X-ray R detected by an X-ray detector 5; a material area determination unit 16 that determines a material area 27 that is an area divided for each shape of an object 3 included in a target 2 based on the distribution of the transmittance; a muon passage coordinate analysis unit 17 that analyzes the passage coordinates and the passage angle of muon μ that has passed through each of muon trajectory detectors 6, 7; a muon trajectory data extraction unit 18 that extracts the trajectory of muon μ that has passed through the material area 27 based on the passage coordinates and the passage angle; and a muon scattering analysis unit 19 that analyzes a scattering angle θ of muon scattering that has occurred in the material area 27 based on the trajectory.SELECTED DRAWING: Figure 1
【課題】物質の種類の識別能力と分解能の双方を高めることができる非破壊検査技術を提供する。【解決手段】非破壊検査システム1は、X線発生装置4で発生させたX線Rの強度とX線検出器5で検出されたX線Rの強度との差に基づいて、X線Rの透過率を解析するX線透過率解析部15と、透過率の分布に基づいて、対象物2に含まれる物体3の形状毎に分けられる領域である物質領域27を判定する物質領域判定部16と、それぞれのミュオン軌跡検出器6,7を通過したミュオンμの通過座標および通過角度を解析するミュオン通過座標解析部17と、通過座標および通過角度に基づいて、物質領域27を通過したミュオンμの軌跡を抽出するミュオン軌跡データ抽出部18と、軌跡に基づいて、物質領域27で生じたミュオン散乱の散乱角θを解析するミュオン散乱解析部19を備える。【選択図】図1 |
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Bibliography: | Application Number: JP20210095564 |