SAMPLE PROCESSOR AND METHOD FOR PROCESSING INFORMATION
To provide a sample processor that can accurately determine timing of the end of processing.SOLUTION: A sample processor for processing a sample by irradiating the sample with an ion beam includes: an ion source for irradiating the sample with the ion beam; a sample stage for holding the sample; a c...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
15.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a sample processor that can accurately determine timing of the end of processing.SOLUTION: A sample processor for processing a sample by irradiating the sample with an ion beam includes: an ion source for irradiating the sample with the ion beam; a sample stage for holding the sample; a camera for imaging the sample; and a processing unit for determining the end of processing on the basis of the image taken by the camera. The processing unit performs the processing of: acquiring an image; acquiring information on the position of a target of processing; detecting an edge of a processing region in the image; detecting a hole formed in the processing region in the image; and determining whether the edge or the hole in the processing target has reached the target position; and ending the processing if the edge or the hole in the processing region is determined to be in the target position.SELECTED DRAWING: Figure 18
【課題】加工の終了のタイミングを正確に判断できる試料加工装置を提供する。【解決手段】試料にイオンビームを照射して試料を加工する試料加工装置であって、試料にイオンビームを照射するイオン源と、試料を保持する試料ステージと、試料を撮影するカメラと、カメラで撮影された画像に基づいて、加工の終了を判断する処理部と、を含み、処理部は、画像を取得する処理と、加工の目標位置の情報を取得する処理と、画像において加工領域のエッジを検出する処理と、画像において加工領域に形成された孔を検出する処理と、加工領域のエッジまたは孔が目標位置に到達したか否かを判定する処理と、加工領域のエッジまたは孔が目標位置に到達したと判定した場合に、加工を終了する処理と、を行う。【選択図】図18 |
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Bibliography: | Application Number: JP20210094688 |