FILTER AND MANUFACTURING METHOD THEREOF

To realize a filter that can adapt the reflection delay of a first-stage coupling part to a change in a passband due to a manufacturing error in a substrate or the like.SOLUTION: A filter (1) includes a dielectric substrate (2), a first-stage coupling portion formed on the substrate (2), and an inte...

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Bibliographic Details
Main Authors MIYAMOTO TAKAHIRO, SUKEGAWA TAKESHI
Format Patent
LanguageEnglish
Japanese
Published 15.12.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRICITY
RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
WAVEGUIDES
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Summary:To realize a filter that can adapt the reflection delay of a first-stage coupling part to a change in a passband due to a manufacturing error in a substrate or the like.SOLUTION: A filter (1) includes a dielectric substrate (2), a first-stage coupling portion formed on the substrate (2), and an inter-stage coupling portion formed on the substrate (2). The first-stage coupling portion is formed such that the reflection delay decreases as the passband increases due to manufacturing error in the substrate (2) or the inter-stage coupling portion, or is formed such that the reflection delay increases as the passband decreases.SELECTED DRAWING: Figure 1 【課題】基板などの製造誤差による通過帯域の変化に初段結合部の反射ディレイを対応させることができるフィルタを実現する。【解決手段】本開示の一形態に係るフィルタ（１）は、誘電性を有する基板（２）と、基板（２）に形成された初段結合部と、基板（２）に形成された段間結合部と、を備える。初段結合部は、基板（２）又は段間結合部の製造誤差による通過帯域の増加に応じて、反射ディレイが減少するように形成されている、又は、通過帯域の減少に応じて、反射ディレイが増加するように形成されている。【選択図】図１
Bibliography:Application Number: JP20210094160