PLASMA PROCESSING APPARATUS

• Main Authors: EHARA HIROKI, YAMAGISHI SHOJI, NAKAGOME ATSUSHI, HAYASHI HIROYUKI
• Format: Patent
• Language: English; Japanese
• Published: 13.12.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a plasma processing apparatus having a gas supply structure for avoiding an abnormal discharge.SOLUTION: A plasma processing apparatus includes: a processing container; a power supply that supplies power of a high frequency or a microwave for generating plasma in the processing container; a plurality of gas nozzles having a gas circulation path in an inner part; and a plurality of projection parts formed integrally with a top wall and/or a side wall for defining the processing container, and projected from the top wall and/or the side wall. Each of the plurality of projection parts includes a gas hole at a tip end, and the top wall and/or the side wall includes a concave part in which each of the plurality of gas nozzles is arranged so that the gas circulation path is communicated with the gas hole of each of the plurality of projection parts.SELECTED DRAWING: Figure 4 【課題】異常放電を回避するためのガス供給構造を有するプラズマ処理装置を提供する。【解決手段】処理容器と、前記処理容器内においてプラズマを生成するための高周波又はマイクロ波の電力を供給する電源と、内部にガス流通路を有する複数のガスノズルと、前記処理容器を画成する天壁及び／又は側壁と一体に形成され、前記天壁及び／又は側壁から突出する複数の突出部と、を有し、前記複数の突出部のそれぞれは、先端にガス孔を有し、前記天壁及び／又は側壁は、前記複数の突出部のそれぞれが有する前記ガス孔に前記ガス流通路が連通するように前記複数のガスノズルのそれぞれが配置される凹部を有する、プラズマ処理装置が提供される。【選択図】図４