PELLICLE FOR EXTREME ULTRAVIOLET EXPOSURE

• Main Authors: KIM SUL-GI, SEONG KI HUN, KIM HYEONG KEUN, KIM HYUN MI, CHO JIN WOO
• Format: Patent
• Language: English; Japanese
• Published: 26.10.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a pellicle for extreme ultraviolet exposure that is used in an exposure process using extreme ultraviolet rays.SOLUTION: A pellicle for extreme ultraviolet exposure includes a pellicle layer formed of an M-α material in which M is combined with α. Here, M is one of Si, Zr, Mo, Ru, Y, W, Ti, Ir, and Nb, and α is at least two of B, N, C, O, and F.SELECTED DRAWING: Figure 1 【課題】本発明は、極紫外線を用いた露光工程に使用される極紫外線露光用ペリクルに関する。【解決手段】本発明による極紫外線露光用ペリクルは、Ｍおよびαを組み合わせたＭ－α素材で形成されるペリクル層を含む。ここで、Ｍは、Ｓｉ、Ｚｒ、Ｍｏ、Ｒｕ、Ｙ、Ｗ、Ｔｉ、ＩｒおよびＮｂのうち一つであり、αは、Ｂ、Ｎ、Ｃ、ＯおよびＦのうち少なくとも２個である。【選択図】図１