SEMICONDUCTOR STORAGE DEVICE

To provide a semiconductor storage device whose readout operation is accelerated.SOLUTION: A semiconductor storage device includes a control circuit that applies first voltage to a first conductive layer WLE4, a second conductive layer WLO4, and a sixth conductive layer WLO5, applies second voltage,...

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Bibliographic Details
Main Authors IKEGAMI KAZUTAKA, MAEDA TAKASHI, SANO KYOSUKE, FUNATSUKI RIEKO
Format Patent
LanguageEnglish
Japanese
Published 03.10.2022
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Summary:To provide a semiconductor storage device whose readout operation is accelerated.SOLUTION: A semiconductor storage device includes a control circuit that applies first voltage to a first conductive layer WLE4, a second conductive layer WLO4, and a sixth conductive layer WLO5, applies second voltage, which is higher than the first voltage, to a third conductive layer WLE3 and a fifth conductive layer WLE5, then applies third voltage, which is lower than the first voltage, to the first conductive layer, applies fourth voltage, which is lower than the first voltage, to the sixth conductive layer, applies fifth voltage, which is lower than the first voltage, to the second conductive layer, then applies sixth voltage, which is higher than the third voltage and lower than the first voltage, to the first conductive layer, applies seventh voltage, which is different from the fourth voltage and lower than the first voltage, to the sixth conductive layer, and applies eighth voltage, which is lower than the fifth voltage, to the second conductive layer.SELECTED DRAWING: Figure 18 【課題】読み出し動作の高速化がされた半導体記憶装置を提供する。【解決手段】半導体記憶装置は、第1導電層WLE4、第2導電層WLO4及び第6導電層WLO5に第1電圧を印加し、第3導電層及WLE3び第5導電層WLE5に第1電圧より高い第2電圧を印加し、その後、第1導電層に第1電圧より低い第3電圧を印加し、第6導電層に第1電圧より低い第4電圧を印加し、第2導電層に第1電圧より低い第5電圧を印加し、その後、第1導電層に第3電圧より高く第1電圧より低い第6電圧を印加し、第6導電層に前記第4電圧と異なり第1電圧より低い第7電圧を印加し、第2導電層に第5電圧より低い第8電圧を印加する、制御回路を備える。【選択図】図18
Bibliography:Application Number: JP20210045261