IGNITION METHOD AND PLASMA PROCESSING DEVICE

• Main Authors: KOBAYASHI TAKESHI, IGARASHI KAZUMASA, ANDO TAKESHI
• Format: Patent
• Language: English; Japanese
• Published: 26.09.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To achieve stable plasma ignition.SOLUTION: An ignition method for a plasma processing device including a high-frequency power source that applies a high frequency with variably controlled frequency, a plasma generation unit including an electrode to which the high frequency is applied and generating plasma from gas, and a matching unit provided between the high-frequency power source and the electrode includes the steps of: applying a high frequency with a first frequency to the electrode from the high-frequency power source to ignite plasma in the plasma generation unit; and after a predetermined time from the application of the high frequency with the first frequency from the high-frequency power source, applying a high frequency with a second frequency that is different from the high frequency with the first frequency.SELECTED DRAWING: Figure 7 【課題】安定したプラズマ着火を実現する。【解決手段】可変に制御された周波数の高周波を印加する高周波電源と、前記高周波が印加される電極を有し、ガスからプラズマを生成するプラズマ生成部と、前記高周波電源と前記電極との間に設けられた整合器と、を有するプラズマ処理装置における着火方法であって、前記高周波電源から第１周波数の高周波を前記電極に印加し、前記プラズマ生成部にてプラズマを着火する工程と、前記高周波電源から前記第１周波数の高周波を印加してから所定時間後、前記第１周波数の高周波と異なる第２周波数の高周波を印加する工程と、を含む着火方法される。【選択図】図７