INSPECTION DEVICE AND WAVE SURFACE ABERRATION MEASUREMENT METHOD
To provide an inspection device and a wave surface aberration measurement method that can measure the wave surface aberration instantly at high accuracy.SOLUTION: An inspection device 1 according to an embodiment includes a stage 10 on which a specimen 11 is disposed at the inspection and a point li...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
06.09.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide an inspection device and a wave surface aberration measurement method that can measure the wave surface aberration instantly at high accuracy.SOLUTION: An inspection device 1 according to an embodiment includes a stage 10 on which a specimen 11 is disposed at the inspection and a point light source is disposed at the measurement of the aberration, an object lens 20 that transmits inspection light L1 resulting from reflection of illumination light L0 on the specimen 11 at the inspection, and measurement light L2 from the point light source at the measurement of the aberration, a pupil relay lens 21 that transmits the inspection light L1 and the measurement light L2 and has the focal distance longer than that of the object lens 20, a pupil relay lens 22 that forms an intermediate imaging surface between the pupil relay lens 21 and the pupil relay lens 22, a diffraction grating 40 that is disposed between the pupil relay lens 21 and the intermediate imaging surface and that diffracts the measurement light L2, a PDI plate 50 that is disposed in the vicinity within the focal depth of the intermediate imaging surface and that selectively transmits the diffraction light diffracted by the diffraction grating 40, a detector 30 that detects an image of the specimen, and a detector 60 that detects an interference image of the measurement light.SELECTED DRAWING: Figure 2
【課題】波面収差をその場で高精度に計測することができる検査装置及び波面収差計測方法を提供する。【解決手段】実施形態に係る検査装置1は、検査時に試料11が配置され、収差計測時に点光源が配置されるステージ10と、検査時に照明光L0が試料11で反射した検査光L1及び収差計測時に点光源からの計測光L2を透過させる対物レンズ20と、検査光L1及び計測光L2を透過させる瞳リレーレンズ21であって、対物レンズ20の焦点距離よりも長い焦点距離を有する瞳リレーレンズ21と、瞳リレーレンズ21との間に中間結像面が形成される瞳リレーレンズ22と、瞳リレーレンズ21と中間結像面との間に配置され、計測光L2を回折させる回折格子40と、中間結像面の焦点深度内の近傍に配置され、回折格子40により回折された回折光を選択透過させるPDI板50と、試料の像を検出する検出器30と、計測光の干渉像を検出する検出器60とを備える。【選択図】図2 |
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Bibliography: | Application Number: JP20210028195 |