EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING ARTICLE

• Main Author: MOTEGI TAKESHI
• Format: Patent
• Language: English; Japanese
• Published: 29.08.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

To provide a technique advantageous on the point of forming accuracy of a pattern onto a substrate in scanning exposure.SOLUTION: An exposure apparatus that performs scanning exposure of a shot region of a substrate by scanning the substrate with respect to exposure light, comprises: a measurement p...