CAPACITOR COMPONENT

To suppress reduction of electrostatic capacitance and furthermore to improve withstand voltage of a capacitor component including an internal electrode provided in a porous main body.SOLUTION: A capacitor component 1 comprises: a porous main body 10 having a plurality of through-holes 11 extending...

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Bibliographic Details
Main Authors AOYAGI YOSHIO, KAWASHIMA TASUKU, MASUDA HIDETOSHI, TAKE NOBUAKI
Format Patent
LanguageEnglish
Japanese
Published 16.08.2022
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Summary:To suppress reduction of electrostatic capacitance and furthermore to improve withstand voltage of a capacitor component including an internal electrode provided in a porous main body.SOLUTION: A capacitor component 1 comprises: a porous main body 10 having a plurality of through-holes 11 extending in a first direction; a first internal electrode; and a second internal electrode. First grooves 12a, 12c, 12e, 12g are formed in the porous main body in such a manner that the first grooves penetrate the porous main body in the first direction and extend in a second direction orthogonal to the first direction. First electrode layers 23a to 23d included in the first internal electrode are embedded in the first grooves. Second grooves 12b, 12d, 12f, 12h each of which faces a first groove via a wall portion 13 are formed in the porous main body. Second electrode layers 24a to 24d included in the second internal electrode are embedded in the second grooves. Wall portions include at least two of the plurality of through-holes of the porous main body along a third direction orthogonal to the first direction and the second direction.SELECTED DRAWING: Figure 3 【課題】多孔性本体内に設けられた内部電極を有するキャパシタ部品において静電容量の低下を抑制しつつ耐電圧を向上させる。【解決手段】キャパシタ部品1は、第1方向に延びる複数の貫通孔11を有する多孔性本体10と、第1内部電極と、第2内部電極と、を備える。多孔性本体には、当該多孔性本体を第1方向に貫通しその第1方向と直交する第2方向に延びるように第1溝12a、12c、12e、12gが形成されている。第1内部電極に含まれる第1電極層23a~23dは、この第1溝に埋め込まれる。多孔性本体には、壁部13を介して第1溝と対向する第2溝12b、12d、12f、12hが形成されている。第2内部電極に含まれる第2電極層24a~24dは、この第2溝に埋め込まれる。壁部は、第1方向及び第2方向に直交する第3方向に沿って多孔性本体の複数の貫通孔のうちの少なくとも2つを含む。【選択図】図3
Bibliography:Application Number: JP20210016089