METHOD FOR MANUFACTURING VIBRATION ELEMENT
To provide a method for manufacturing a vibration element that has reduced variations in groove depth and can obtain stable vibration characteristics.SOLUTION: A method for manufacturing a vibration element is a method for manufacturing a vibration element having a base, and a first vibration arm an...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
10.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a method for manufacturing a vibration element that has reduced variations in groove depth and can obtain stable vibration characteristics.SOLUTION: A method for manufacturing a vibration element is a method for manufacturing a vibration element having a base, and a first vibration arm and a second vibration arm extending from the base along a first direction and arranged side by side along a second direction intersecting with the first direction, and having bottomed grooves on both principal surfaces of the first vibration arm and both principal surfaces of the second vibration arm, and the method includes: a preparation step of preparing a crystal substrate; a protective film forming step of removing groove areas of the crystal substrate that are areas where the grooves are formed to form a protective film; and a dry etching step of performing dry etching on the crystal substrate through the protective film to form the grooves. The grooves provided in at least any one of the first vibration arm and the second vibration arm have a first groove and a second groove arranged side by side along the second direction.SELECTED DRAWING: Figure 7
【課題】溝深さのバラつきが少なく、安定した振動特性が得られる振動素子の製造方法を提供すること。【解決手段】振動素子の製造方法は、基部と、前記基部から第1方向に沿って延出し、前記第1方向と交差する第2方向に沿って並ぶ第1振動腕および第2振動腕と、を備え、前記第1振動腕の両主面および前記第2振動腕の両主面に有底の溝を有する振動素子の製造方法であって、水晶基板を用意する準備工程と、前記水晶基板の、前記溝が形成される領域である溝領域を除いて、保護膜を形成する保護膜形成工程と、前記保護膜を介して前記水晶基板をドライエッチングし、前記溝を形成するドライエッチング工程と、を含み、前記第1振動腕および前記第2振動腕のうち少なくともいずれか一方に設けられた前記溝は、前記第2方向に沿って並ぶ第1溝および第2溝を有する。【選択図】図7 |
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Bibliography: | Application Number: JP20210137805 |