SUBSTRATE PROCESSING APPARATUS AND METHOD

• Main Authors: CHOI BYOUNG DOO, CHOI JIN HO
• Format: Patent
• Language: English; Japanese
• Published: 13.07.2022
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

To provide an apparatus for processing a substrate.SOLUTION: A substrate processing apparatus according to the present invention includes a processing container having a processing space for processing a substrate, a standby port located on one side of the processing container and waiting for a nozzle to discharge a processing liquid, and a liquid supply unit that is moved between the processing container and the standby port and includes the nozzle. The standby port includes a nozzle accommodating member having a nozzle cleaning unit having an accommodating space for accommodating the nozzle and a cleaning liquid inside, and a discharge unit provided on the side surface of the nozzle cleaning unit and having a discharge port for discharging the cleaning liquid to the nozzle. When viewed from above, the discharge port is provided so as to overlap at least a portion of the nozzle.SELECTED DRAWING: Figure 12 【課題】本発明は基板を処理する装置を提供する。【解決手段】本発明の基板処理装置は、基板を処理する処理空間を有する処理容器と、前記処理容器の一側に位置され、処理液を吐出するノズルが待機される待機ポートと、前記処理容器と前記待機ポートとの間に移動され、前記ノズルを有する液供給ユニットを含み、前記待機ポートは、内部に前記ノズルと洗浄液を収容可能な収容空間を有するノズル洗浄部を含むノズル収容部材と、前記ノズル洗浄部の側面に提供されて前記洗浄液を前記ノズルに吐出する吐出口を有する吐出部を含み、上側から見た時前記吐出口は前記ノズルの少なくとも一部と重畳されるように提供される。【選択図】図１２