MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT, AND CHEMICAL SOLUTION USED FOR MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

• Main Authors: TAKAHASHI KAZUHIRO, WADA YUKIHISA
• Format: Patent
• Language: English; Japanese
• Published: 08.07.2022
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FATTY ACIDS THEREFROM; METALLURGY; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

To provide a manufacturing method of a semiconductor element including a step capable of sufficiently cleaning and removing a ruthenium residue formed on a substrate surface by bringing a chemical solution into contact with the substrate surface after performing dry etching or chemical mechanical po...