METHOD FOR REMOVING PRODUCT, METHOD FOR REMOVING FLUX, AND DEVICE FOR REMOVING PRODUCT

To provide: a method for removing a product improving removal efficiency of the product and enhancing effect for cleaning the inside of a treatment chamber; a method for removing flux; and a device for removing a product.SOLUTION: A method for removing a product comprises: introducing atmospheric ga...

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Bibliographic Details
Main Authors TAKANO YASUYUKI, YAMAGUCHI NAOSHI, KANDA TOSHIRO, MATSUMOTO YOSHIKI
Format Patent
LanguageEnglish
Japanese
Published 06.07.2022
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Summary:To provide: a method for removing a product improving removal efficiency of the product and enhancing effect for cleaning the inside of a treatment chamber; a method for removing flux; and a device for removing a product.SOLUTION: A method for removing a product comprises: introducing atmospheric gas having a product generated in the inside of a treatment chamber under a low-oxygen atmosphere to a product removing part having a corona discharge space; and removing the product the atmospheric gas has. The method includes: a mixing step for generating mixed gas by mixing the atmospheric gas discharged from the treatment chamber through piping connecting the treatment chamber and the corona discharge space, and gas having higher electric resistance than that of the atmospheric gas in the piping or the corona discharge space; and a removing step for removing the product from the mixture gas in the corona discharge space in which the mixture gas is introduced through the piping or the mixture gas is generated inside by a corona discharge system.SELECTED DRAWING: Figure 1A 【課題】生成物の除去効率を向上させ、処理室の内部の浄化効果を高める生成物の除去方法及びフラックスの除去方法及び生成物の除去装置を提供すること【解決手段】低酸素雰囲気下の処理室の内部で生じる生成物を有する雰囲気ガスを、コロナ放電空間を有する生成物除去部に導入し、前記雰囲気ガスが有する前記生成物を除去する、生成物の除去方法であって、前記処理室と前記コロナ放電空間とを接続する配管を介して前記処理室から排出された前記雰囲気ガスと、前記配管又は前記コロナ放電空間において、前記雰囲気ガスよりも電気抵抗が高いガスとを混合させて混合ガスを生成する混合工程と、前記混合ガスが前記配管を介して導入され又は前記混合ガスが内部で生成された前記コロナ放電空間において、前記混合ガスから、コロナ放電方式により前記生成物を除去する除去工程と、を含む。【選択図】図1A
Bibliography:Application Number: JP20200215299