SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

To provide a semiconductor device and a method for manufacturing the same that can improve its characteristics.SOLUTION: A semiconductor device includes a first electrode, a second electrode, a third electrode, a semiconductor member, and a first compound member. A first compound region of the first...

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Main Authors MUKAI AKIRA, ONO HIROSHI, KAJIWARA AKIHIRO, KURAGUCHI MASAHIKO, DAVID MATTHEW SMITH
Format Patent
LanguageEnglish
Japanese
Published 28.06.2022
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Summary:To provide a semiconductor device and a method for manufacturing the same that can improve its characteristics.SOLUTION: A semiconductor device includes a first electrode, a second electrode, a third electrode, a semiconductor member, and a first compound member. A first compound region of the first compound member is between a fourth partial region of the semiconductor member and at least a portion of the third electrode. A first angle between a first side surface of the first compound region and a first surface of the first compound member is less than 90 degrees.SELECTED DRAWING: Figure 1 【課題】特性を向上できる半導体装置及びその製造方法を提供する。【解決手段】実施形態によれば、半導体装置は、第1電極、第2電極、第3電極、半導体部材、及び、第1化合物部材を含む。前記第1化合物部材の第1化合物領域は、前記半導体部材の第4部分領域と第3電極の少なくとも一部との間にある。前記第1化合物領域の第1側面と、前記第1化合物部材の第1面と、の間の第1角度は90度よりも小さい。【選択図】図1
Bibliography:Application Number: JP20200208394