RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
To provide a resist composition good in any of reduction property of roughness, collapse margin. and pattern film retention, and a method of forming a resist pattern using the resist composition.SOLUTION: A resist composition includes: a compound represented by a general formula (d1-1), or a general...
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Format | Patent |
Language | English Japanese |
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14.06.2022
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Abstract | To provide a resist composition good in any of reduction property of roughness, collapse margin. and pattern film retention, and a method of forming a resist pattern using the resist composition.SOLUTION: A resist composition includes: a compound represented by a general formula (d1-1), or a general formula (d1-2); and a polymer compound (A01) having a constitutional unit (a01) represented by a general formula (a0-1), a constitutional unit (a02) represented by a general formula (a0-2), and a constitutional unit (a03) represented by a general formula (a0-3). In formula (a0-1)-(a0-3), Ra01 is a lactone-containing cyclic group having a cyano group and the like. Xaa0 together with Yaa0, and Xab0 together with Yab0 are monocyclic alicyclic hydrocarbon group-forming groups.SELECTED DRAWING: None
【課題】ラフネスの低減性、倒れマージン、及び、パターン残膜がいずれも良好なレジスト組成物、及び当該レジスト組成物を用いたレジストパターン形成方法の提供。【解決手段】一般式(d1-1)で表される化合物、又は一般式(d1-2)で表される化合物と、一般式(a0-1)で表される構成単位(a01)、一般式(a0-2)で表される構成単位(a02)、及び一般式(a0-3)で表される構成単位(a03)を有する高分子化合物(A01)とを含有する、レジスト組成物。式(a0-1)~(a0-3)中、Ra01は、シアノ基等を有するラクトン含有環式基である。Xaa0は、Yaa0と共に、Xab0は、Yab0と共に単環の脂環式炭化水素基を形成する基である。[化1]TIFF2022088041000088.tif43170【選択図】なし |
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AbstractList | To provide a resist composition good in any of reduction property of roughness, collapse margin. and pattern film retention, and a method of forming a resist pattern using the resist composition.SOLUTION: A resist composition includes: a compound represented by a general formula (d1-1), or a general formula (d1-2); and a polymer compound (A01) having a constitutional unit (a01) represented by a general formula (a0-1), a constitutional unit (a02) represented by a general formula (a0-2), and a constitutional unit (a03) represented by a general formula (a0-3). In formula (a0-1)-(a0-3), Ra01 is a lactone-containing cyclic group having a cyano group and the like. Xaa0 together with Yaa0, and Xab0 together with Yab0 are monocyclic alicyclic hydrocarbon group-forming groups.SELECTED DRAWING: None
【課題】ラフネスの低減性、倒れマージン、及び、パターン残膜がいずれも良好なレジスト組成物、及び当該レジスト組成物を用いたレジストパターン形成方法の提供。【解決手段】一般式(d1-1)で表される化合物、又は一般式(d1-2)で表される化合物と、一般式(a0-1)で表される構成単位(a01)、一般式(a0-2)で表される構成単位(a02)、及び一般式(a0-3)で表される構成単位(a03)を有する高分子化合物(A01)とを含有する、レジスト組成物。式(a0-1)~(a0-3)中、Ra01は、シアノ基等を有するラクトン含有環式基である。Xaa0は、Yaa0と共に、Xab0は、Yab0と共に単環の脂環式炭化水素基を形成する基である。[化1]TIFF2022088041000088.tif43170【選択図】なし |
Author | KAIHO TAKAAKI SOMEYA YASUO ADEGAWA MINORU |
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DocumentTitleAlternate | レジスト組成物及びレジストパターン形成方法 |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN |
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