HIGH-FREQUENCY SUBSTRATE

To provide a high-frequency substrate that can achieve impedance matching in a high frequency range.SOLUTION: A high-frequency substrate includes a first substrate, a second substrate laminated on the surface of the first substrate, a first metal layer that covers the inner surface of a through hole...

Full description

Saved in:
Bibliographic Details
Main Author ASAHI YASUAKI
Format Patent
LanguageEnglish
Japanese
Published 08.06.2022
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:To provide a high-frequency substrate that can achieve impedance matching in a high frequency range.SOLUTION: A high-frequency substrate includes a first substrate, a second substrate laminated on the surface of the first substrate, a first metal layer that covers the inner surface of a through hole that communicates from the front surface of the second substrate to the back surface of the first substrate, a first strip line provided on the surface of the second substrate, a second strip line provided on the back surface of the first substrate and electrically connected to the first strip line via the first metal layer, and a second metal layer extending between the first substrate and the second substrate and provided apart from the first metal layer. The second substrate includes a first region, a second region, and a third region arranged in a direction along the surface of the first substrate, and the third region is provided between the first region and the second region, and in the second region and the third region, a recess is provided on the surface side of the second substrate.SELECTED DRAWING: Figure 1 【課題】高周波領域においてインピーダンス整合を実現できる高周波基板を提供する。【解決手段】高周波基板は、第1基板と、前記第1基板の表面上に積層された第2基板と、前記第2基板の表面から前記第1基板の裏面に連通する貫通孔の内面を覆う第1金属層と、前記第2基板の表面上に設けられた第1ストリップ線路と、前記第1基板の裏面上に設けられ、前記第1金属層を介して前記第1ストリップ線路に電気的に接続された第2ストリップ線路と、前記第1基板と前記第2基板との間に延在し、前記第1金属層から離間して設けられた第2金属層と、を備える。前記第2基板は、前記第1基板の前記表面に沿った方向に並ぶ第1領域、第2領域および第3領域を含み、前記第3領域は、前記第1領域と前記第2領域との間に設けられ、前記第2領域および前記第3領域は、前記第2基板の前記表面側に凹部を設ける。【選択図】図1
Bibliography:Application Number: JP20200196999