COOLING DEVICE AND SUBSTRATE PROCESSING APPARATUS
To provide a cooling device capable of, even if there is a region outside of a virtual circle in a cooling object region of an object to be cooled, easily cooling a region inside of the circle and the region outside of the circle.SOLUTION: According to an embodiment, a cooling device includes a bloc...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
01.06.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a cooling device capable of, even if there is a region outside of a virtual circle in a cooling object region of an object to be cooled, easily cooling a region inside of the circle and the region outside of the circle.SOLUTION: According to an embodiment, a cooling device includes a block body on which an object to be cooled is disposed on an upper side, and a supporting unit that supports the object to be cooled from a lower side thereof. The block body forms a first flow path through which coolant gas flows from a lower side to an upper side toward a region to be cooled of the object to be cooled, and a second flow path having an annular plane that is continuous with the first flow path and circularly extends with the first flow path as the center, and allows the coolant gas to flow radially outward with respect to the first flow path in the region to be cooled. The supporting unit is provided so as to surround an outside of the block body. The supporting unit forms a third flow path that is continuously with an outside of the second flow path and is narrower than the second flow path in a state where the region to be cooled of the object to be cooled is disposed on an upper side. The third flow path allows the coolant gas to flow outside of the annular surface of the block body.SELECTED DRAWING: Figure 3
【課題】 冷却対象物の冷却対象領域に仮想的な円の外側の領域がある場合であっても、その円の内側及びその円の外側の領域を冷却し易い、冷却装置を提供する。【解決手段】 実施形態によれば、冷却装置は、冷却対象物が上側に配置されるブロック体と、冷却対象物を下側から支持する支持部とを有する。ブロック体は、冷却対象物の冷却対象領域に向けて下側から上側に冷却ガスを流す第1の流路、及び、第1の流路に連続し、第1の流路を中心として円環状に広がり、冷却ガスを冷却対象領域の第1の流路に対して径方向外方に流す環状面を有する第2の流路、を形成する。支持部は、ブロック体の外側を囲むように設けられている。支持部は、第2の流路の外側に連続し、冷却対象物の冷却対象領域が上側に配置された状態で、第2の流路よりも狭く、冷却ガスをブロック体の環状面の外側に流す第3の流路を形成する。【選択図】 図3 |
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Bibliography: | Application Number: JP20200193382 |