SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To simplify a step of manufacturing a semiconductor device.SOLUTION: A semiconductor device has an organic film 40 that is formed with a through hole 43 penetrating in a z direction and has electric insulation properties, a conductive layer 31 that is formed on the organic film 40 and is formed of a...

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Bibliographic Details
Main Author KAGEYAMA SATOSHI
Format Patent
LanguageEnglish
Japanese
Published 17.05.2022
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Summary:To simplify a step of manufacturing a semiconductor device.SOLUTION: A semiconductor device has an organic film 40 that is formed with a through hole 43 penetrating in a z direction and has electric insulation properties, a conductive layer 31 that is formed on the organic film 40 and is formed of a Cu-based alloy containing no Ti, a Cu wiring layer 32 formed on the conductive layer 31, a semiconductor element 20 mounted on the Cu wiring layer 32, a sealing resin 50 sealing the semiconductor element 20, and an external terminal 60 connected to the conductive layer 31. The conductive layer 31 has an exposure conductive part 31a exposed from the through hole 43 of the organic film 40. The external terminal 60 is brought into contact with the exposure conductive part 31a.SELECTED DRAWING: Figure 3 【課題】半導体装置の製造工程を簡素化すること。【解決手段】半導体装置は、z方向に貫通した貫通孔43が形成された電気絶縁性を有する有機膜40と、有機膜40上に形成されており、Tiを含まないCu系の合金から形成された導電層31と、導電層31上に形成されたCu配線層32と、Cu配線層32上に実装された半導体素子20と、半導体素子20を封止する封止樹脂50と、導電層31に接続された外装端子60と、を備えている。導電層31は、有機膜40の貫通孔43から露出した露出導電部31aを有している。外装端子60は、露出導電部31aに接している。【選択図】図3
Bibliography:Application Number: JP20200181061