PARTICLE DISPERSION POLYIMIDE PRECURSOR SOLUTION, MANUFACTURING METHOD OF POROUS POLYIMIDE FILM, AND POROUS POLYIMIDE FILM
To provide a particle dispersion polyimide precursor solution excellent in dispersion stability of particles.SOLUTION: There is provided a particulate dispersed polyimide precursor solution containing both a polyimide precursor having a unit represented by a formula (I) and particles and a solvent a...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
09.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a particle dispersion polyimide precursor solution excellent in dispersion stability of particles.SOLUTION: There is provided a particulate dispersed polyimide precursor solution containing both a polyimide precursor having a unit represented by a formula (I) and particles and a solvent and satisfying both conditions (1) and (2). Condition (1): a total content of specific groups [(B1) - (B4)] is 1 mass% or larger and 40 mass% or smaller to a total amount of the polyimide precursor. Condition (2): a content of particles is 5 mass% or larger and 90 mass% or smaller relative to a total content of the polyimide precursor and particles. In the formula (I), A represents a quadrivalent organic group, B represents a divalent organic group represented by any one of the particular groups [(B1) to (B4)].SELECTED DRAWING: None
【課題】粒子の分散安定性に優れる、粒子分散ポリイミド前駆体溶液の提供。【解決手段】式(I)で示される単位を有するポリイミド前駆体と粒子と溶媒とを含有し、条件(1)及び(2)の両方を満たす粒子分散ポリイミド前駆体溶液。条件(1):特定の基[(B1)~(B4)]の合計含有量はポリイミド前駆体全体の量に対し1質量%以上40質量%以下。条件(2):粒子の含有量はポリイミド前駆体及び粒子の合計含有量に対し5質量%以上90質量%以下。式(I)中、Aは4価の有機基を示し、Bは前記特定の基[(B1)~(B4)]のいずれかで示される2価の有機基を示す。JPEG2022067850000044.jpg5379【選択図】なし |
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Bibliography: | Application Number: JP20200176681 |