PROCESSING METHOD FOR ALUMINUM ION-CONTAINING NITRIC ACID SOLUTION
To provide a processing method for an aluminum ion-containing nitric acid solution capable of reducing the used amount of an acid solution necessary for regeneration of a cation exchanger and also capable of eliminating more aluminum ions from the cation exchanger.SOLUTION: A processing method for a...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
22.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a processing method for an aluminum ion-containing nitric acid solution capable of reducing the used amount of an acid solution necessary for regeneration of a cation exchanger and also capable of eliminating more aluminum ions from the cation exchanger.SOLUTION: A processing method for an aluminum ion-containing nitric acid solution comprises carrying out the following processes repeatedly in this order: an aluminum capture process of capturing aluminum ions in a cation exchanger by contacting the cation exchanger with the aluminum ion-containing nitric acid solution; a first regeneration process of obtaining a first process liquid by contacting the cation exchanger with a first acid solution to eliminate the aluminum ion from the cation exchanger; and a second regeneration process of obtaining a second process liquid by contacting the cation exchanger with a second acid solution to eliminate the aluminum ion from the cation exchanger. Hydrochloric acid, sulfuric acid or mixed acid thereof is used as the second acid solution, and the second process liquid is used as the first acid solution.SELECTED DRAWING: None
【課題】陽イオン交換体の再生処理にかかる酸溶液の使用量を低減することができるとともに、陽イオン交換体からより多くのアルミニウムイオンを脱離させることができるアルミニウムイオン含有硝酸溶液の処理方法を提供する。【解決手段】陽イオン交換体をアルミニウムイオン含有硝酸溶液と接触させて、陽イオン交換体にアルミニウムイオンを捕捉させるアルミ捕捉工程と、前記陽イオン交換体を第1酸溶液と接触させて、陽イオン交換体からアルミニウムイオンを脱離させ、第1処理液を得る第1再生工程と、前記陽イオン交換体を第2酸溶液と接触させて、陽イオン交換体からアルミニウムイオンを脱離させ、第2処理液を得る第2再生工程とをこの順番で繰り返し行うアルミニウムイオン含有硝酸溶液の処理方法であって、第2酸溶液として塩酸、硫酸またはこれらの混酸を用い、第1酸溶液として第2処理液を用いる。【選択図】なし |
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Bibliography: | Application Number: JP20200171960 |