PRODUCTION METHOD OF OXYGEN ISOTOPE-LABELLED CARBON MONOXIDE AND PRODUCTION METHOD OF OXYGEN ISOTOPE-LABELLED CARBON DIOXIDE
To provide a production method of oxygen isotope-labelled carbon monoxide which can produce oxygen isotope-labelled carbon monoxide having an oxygen isotope concentration of 99.0 atom% or more, and a production method of oxygen isotope-labelled carbon dioxide which can produce oxygen isotope-labelle...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
11.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a production method of oxygen isotope-labelled carbon monoxide which can produce oxygen isotope-labelled carbon monoxide having an oxygen isotope concentration of 99.0 atom% or more, and a production method of oxygen isotope-labelled carbon dioxide which can produce oxygen isotope-labelled carbon dioxide having an oxygen isotope concentration of 99.0 atom% or more.SOLUTION: A production method of oxygen isotope-labelled carbon monoxide comprises bringing carbon as a raw material and water comprising 17O or 18O at a concentration higher than a natural presence ratio into contact with each other, and then reacting the carbon with oxygen gas comprising 17O or 18O at a concentration higher than the natural presence ratio. A production method of oxygen isotope-labelled carbon dioxide comprises bringing carbon as a raw material and water comprising 17O or 18O at a concentration higher than a natural presence ratio into contact with each other, and then reacting the carbon with oxygen gas comprising 17O or 18O at a concentration higher than the natural presence ratio.SELECTED DRAWING: None
【課題】酸素同位体濃度が99.0原子%以上の酸素同位体標識一酸化炭素を製造することが可能な酸素同位体標識一酸化炭素の製造方法、及び酸素同位体濃度が99.0原子%以上の酸素同位体標識二酸化炭素を製造することが可能な酸素同位体標識二酸化炭素の製造方法の提供。【解決手段】原料としての炭素と、17O又は18Oを天然存在比よりも高濃度に含む水と、を接触させた後、前記炭素と、17O又は18Oを天然存在比よりも高濃度に含む酸素ガスと、を反応させる、酸素同位体標識一酸化炭素の製造方法、並びに原料としての炭素と、17O又は18Oを天然存在比よりも高濃度に含む水と、を接触させた後、前記炭素と、17O又は18Oを天然存在比よりも高濃度に含む酸素ガスと、を反応させる、酸素同位体標識二酸化炭素の製造方法。【選択図】なし |
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Bibliography: | Application Number: JP20200164458 |