MARK FORMATION METHOD, PATTERN FORMATION METHOD AND LITHOGRAPHY DEVICE

To suppress deterioration in detection accuracy of a mark for positioning.SOLUTION: A mark formation method is configured to irradiate a substrate with irradiation light and thereby form a mark on the substrate. The mark formation method includes: a first irradiation step of performing circumferenti...

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Bibliographic Details
Main Author HORIGOME SHOTA
Format Patent
LanguageEnglish
Japanese
Published 08.02.2022
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Summary:To suppress deterioration in detection accuracy of a mark for positioning.SOLUTION: A mark formation method is configured to irradiate a substrate with irradiation light and thereby form a mark on the substrate. The mark formation method includes: a first irradiation step of performing circumferential scanning of irradiation light and irradiating a region not including an outer edge of a mark in a schedule region of a substrate on which the mark is to be formed; and a second irradiation step of performing circumferential scanning of the irradiation light and irradiating a region including the outer edge of the schedule region on which the mark is to be formed so as to complete a formation of the mark. In the second irradiation step, the irradiation light is emitted so as to include the region irradiated at the first irradiation step.SELECTED DRAWING: Figure 5 【課題】位置合わせ用のマークの検出精度の低下を抑制すること。【解決手段】基板に照射光を照射することにより、基板にマークを形成するマーク形成方法であって、照射光の周走査を行い、マークが形成される基板の予定領域のうち、マークの外縁を含まない領域を照射する第1照射工程と、照射光の周走査を行い、基板のマークが形成される予定領域の外縁を含む領域を照射し、マークの形成を完了する第2照射工程と、を含み、第2照射工程では、第1照射工程で照射した領域を含むように、照射光を照射する。【選択図】図5
Bibliography:Application Number: JP20200126314