LITHOGRAPHY APPARATUS, MARK FORMING METHOD, AND PATTERN FORMING METHOD

• Main Authors: KITAGAWA JUN, ANZAI MASATO, KAWABATA NOBUYUKI, IKEDA KENJI, SUZUKI YU, YOSHIOKA YASUTOMO
• Format: Patent
• Language: English; Japanese
• Published: 01.02.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

To suppress reduction of production efficiency in pattern formation on a substrate.SOLUTION: A lithography apparatus that forms a pattern on a substrate having: a mark forming part which irradiates the substrate with irradiation light to form marks; a control part which controls mark forming part; and a mark measurement part which measures positions of marks. The control part, on the basis of information regarding the formation positions of marks formed by the mark forming part, determines at least one of a relative position between irradiation light irradiated from the mark forming part onto the substrate when forming a first mark and the substrate, and a relative position between the mark measurement part and the substrate when measuring the first mark.SELECTED DRAWING: Figure 5 【課題】基板のパターン形成における生産効率の低下を抑制すること。【解決手段】基板にパターンを形成するリソグラフィ装置であって、基板に照射光を照射し、マークを形成するマーク形成部と、マーク形成部を制御する制御部と、マークの位置を計測するマーク計測部と、を有し、制御部は、マーク形成部により形成されるマークの形成位置に関する情報に基づいて、第１マークを形成するときのマーク形成部から基板に照射される照射光と基板の相対位置、及び第１マークを計測するときのマーク計測部と基板の相対位置の少なくとも一方を決定する。【選択図】図５